High-Purity 99% Alumina Aluminum Oxide Ceramic Plate Wafer Substrate: Alumina Ceramic Substrate

99% al2o3 alumina aluminium oxide ceramic plate wafer substrate Alumina ceramic substrate .By accurately grasping the pain points of customers, the 99% al2o3 alumina atomic number 13 oxide ceramic plate wafer substrate developed by us has been supported and praised by the legal age of customers in the market.The William Claude Dukenfield of application include Ceramics.

SKU: CX-AL-66001 Categories:

Our High-Purity 99% Alumina Aluminum Oxide Ceramic Plate Wafer Substrate is engineered to meet the stringent requirements of various applications. Made from premium-grade alumina ceramic, this substrate offers exceptional purity, thermal stability, and electrical insulation properties. Ideal for use in semiconductor, electronic, and optical industries, it provides a reliable foundation for advanced technologies. Upgrade your substrate solutions with our high-quality alumina ceramic plate wafer substrate for superior performance and precision in demanding applications.

 

SKU# Material Color Purity Maximum temperature
CX-AL-66001 Alumina Ceramic White 99% 1600 °C

 

Notes for use:

Handling and Storage: Handle the ceramic substrate with care to avoid damage to its delicate surface. Store it in a clean and dry environment away from direct sunlight to prevent contamination and maintain its purity and integrity.

Surface Preparation: Ensure proper surface preparation before using the substrate for semiconductor or electronic applications. Clean the surface thoroughly to remove any contaminants or particles that could affect the performance of the substrate and the devices fabricated on it.

Temperature Control: Maintain proper temperature control during processing and fabrication to prevent thermal stress and potential damage to the substrate. Follow recommended heating and cooling rates to minimize the risk of cracking or warping, ensuring the substrate’s reliability and longevity.

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